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Figure 1 from Optical proximity correction (OPC)-friendly maze routing | Semantic Scholar
Data-driven and Physics-informed Computational Lithography - Industrial AI - Research - Simulation-driven Structure Design Laboratory
Optical Proximity Correction (OPC) Under Immersion Lithography | IntechOpen
Optical proximity correction - Wikipedia
nanoHUB.org - Resources: ECE 595AL Lecture 3.2: Resolution Enhancement - Resolution Enhancement Techniques (RETs) in Optical Project Lithography: Watch Presentation
Optical proximity correction - Wikipedia
Optical Proximity Correction (OPC) in VLSI - Siliconvlsi
How to make lithography patterns print: the role of OPC and pattern layout
Optical proximity correction – Wikipedia
SignOff Semiconductors on LinkedIn: Optical Proximity Correction (OPC)
A fast and manufacture-friendly optical proximity correction based on machine learning - ScienceDirect
Smart Manufacturing and Metrology Lab. - Optical proximity correction technique for enhancing the resolution of Intel's optical lithographic process
Scientists improve near-field optical proximity correction via spatial modulation
Optical Proximity Correction with Principal Component Regression
Inverse-lithography approach inspired by wave propagation
Optical Proximity Correction in the manufacturing of Integrated Circuits - Part 1 | by Janhavi Giri | Medium
Optical proximity correction with hierarchical Bayes model
4: Optical and Process Correction (from [82]) | Download Scientific Diagram
Optical proximity correction - Wikipedia
optical proximity correction (Chip) (OPC) :: ITWissen.info
Optical Proximity Correction
Tricks in Lithography : Part 2 (OPC, PSM, Off Axis Illumination) - YouTube
Efficient optical proximity correction based on virtual edge and mask pixelation with two-phase sampling
Optical Proximity Correction in the manufacturing of Integrated Circuits - Part 1 | by Janhavi Giri | Medium
Optical proximity correction in geometry sensitive silicon photonics waveguide crossings | Semantic Scholar
Fast optimization of defect compensation and optical proximity correction for extreme ultraviolet lithography mask - ScienceDirect
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